Selenium Deposition System
Our selenium deposition equipment enables safe, efficient and cost-effective CIGS cell production using vapor transport deposition (VTD) in an inert, atmospheric-pressure environment.
Thanks to highly accurate temperature control, it ensures a uniform temperature distribution across the substrate in the deposition area. Together with the laminar flow injector design, this guarantees a homogeneous selenium layer.
Load locks at the entrance and exit of the deposition chamber prevent the release of process gases without the need for gas curtains. This both maximizes safety and reduces the overall cost of operation. It also maintains low contamination levels for higher module efficiency.
- Glass conditioning
- Laminar flow injector
- Thermal evaporator for elemental selenium
Features / benefits
|Product feature||Benefit for you|
|Accurate temperature control with uniform temperature distribution||Homogeneous Se layer for maximum substrate efficiency|
|Load locks at entrance and exit prevent process gases escaping||Extremely safe operation at all times|
|Low oxygen levels < 100 ppm||Less contamination for better module efficiency|
|Balanced gas flow reduces Se deposition in process chamber||Less cleaning and more uptime for higher productivity|
|Laminar flow injector ensures uniform gas flow across substrate width||Homogeneous Se layer for maximum substrate efficiency|
|No gas curtains||Lower inert gas consumption and cost of ownership|
|Automatic evaporator replenishment system||Enables non-stop production|